A. P. Eremin, V. D. Smolyaninov, A. N. Kozlov, A. G. Uvaev
Research Institute for Electron and Ion Optics, Moscow, Russia
A. M. Filachev
ORION Research-and-Productions Association, Moscow, Russia
The special electron-ion-plasma production equipment for manufacture of workpieces of amicrophotoelectronics, microelectronics and precise machine industry is surveyed in the paper. The equipment is intended for drawing the structural thin-film coats, ion-beam etching the semiconductor materials and microwelding the workpieces in vacuum. Given are characteristics, composition and technological opportunities of equipment.