Article: The effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight

A. A. Zhukov, S. A. Zhukova, Y. S. Tchetverov
CNII “CYCLON”, Moscow, Russia

G. A. Korneeva
A. V. Topchiev Institute of Petrochemical Synthesis RAS, Moscow, Russia

The relationship between the rate of plasma-chemical etching of coatings and the molecular weight of polyamidoacide, made from pyrromelite dianhydride and dianiline oxide, and the chemical composition of polyimides is studied. It has been shown by IR spectroscopy that plasma-chemical etching does not produced any chemical transformation in the bulk of totally imidized coatings. The improvement of adhesion characteristics of the PMDA-ODA coating materials is revealed.